Thickness dependent tungsten trioxide thin films deposited using DC magnetron sputtering for electrochromic applications

Ashok Reddy G V; Habibuddin Shaik; K. Naveen Kumar; R. Imran Jafri; Sheik Abdul Sattar; Jyothi Gupta; B.H. Doreswamy

doi:10.1016/j.matpr.2022.11.134

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Thickness dependent tungsten trioxide thin films deposited using DC magnetron sputtering for electrochromic applications

Ashok Reddy G V Habibuddin Shaik K. Naveen Kumar R. Imran Jafri Sheik Abdul Sattar Jyothi Gupta B.H. Doreswamy

Year: 2022 Journal: Materials Today Proceedings Vol: 80 Pages: 817-823 Publisher: Elsevier BV

DOI: 10.1016/j.matpr.2022.11.134

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Keywords:

Electrochromism Materials science Tungsten trioxide Thin film Sputter deposition Sputtering Transmittance Tungsten Diffusion Analytical Chemistry (journal) Electrochromic devices Optoelectronics Optics Nanotechnology Metallurgy Chemistry Electrode

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Transition Metal Oxide Nanomaterials

Physical Sciences → Materials Science → Polymers and Plastics

Gas Sensing Nanomaterials and Sensors

Physical Sciences → Engineering → Electrical and Electronic Engineering

Ga2O3 and related materials

Physical Sciences → Materials Science → Electronic, Optical and Magnetic Materials

Thickness dependent tungsten trioxide thin films deposited using DC magnetron sputtering for electrochromic applications

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