JOURNAL ARTICLE
Advances in X-ray mask technology
Year: 1985 Journal: Microelectronics Reliability Vol: 25 (3)Pages: 588-588 Publisher: Elsevier BV
Keywords:
Reticle Lithography Stepper Next-generation lithography Dram Extreme ultraviolet lithography Overlay X-ray lithography Multiple patterning Photolithography Wafer Computational lithography Computer science Fabrication Photomask Optics Materials science Enhanced Data Rates for GSM Evolution Resist Optoelectronics Nanotechnology Electron-beam lithography Physics Artificial intelligence
Metrics
3
Cited By
0.00
FWCI (Field Weighted Citation Impact)
0
Refs
0.46
Citation Normalized Percentile
Is in top 1%
Is in top 10%
Topics
Advancements in Photolithography Techniques
Physical Sciences → Engineering → Electrical and Electronic Engineering
Electron and X-Ray Spectroscopy Techniques
Physical Sciences → Materials Science → Surfaces, Coatings and Films
Advanced Surface Polishing Techniques
Physical Sciences → Engineering → Biomedical Engineering
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