JOURNAL ARTICLE
Plasma deposition of silicon dioxide and silicon nitride films
Year: 1981 Journal: Microelectronics Reliability Vol: 21 (5)Pages: 763-763 Publisher: Elsevier BV
Keywords:
Silicon dioxide Silicon nitride Deposition (geology) Materials science Silicon LOCOS Plasma Nitride Optoelectronics Chemical engineering Nanotechnology Composite material Engineering Layer (electronics) Physics
Metrics
4
Cited By
0.69
FWCI (Field Weighted Citation Impact)
0
Refs
0.76
Citation Normalized Percentile
Is in top 1%
Is in top 10%
Topics
Metal and Thin Film Mechanics
Physical Sciences → Engineering → Mechanics of Materials
Semiconductor materials and devices
Physical Sciences → Engineering → Electrical and Electronic Engineering
Plasma Diagnostics and Applications
Physical Sciences → Engineering → Electrical and Electronic Engineering
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