Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films

Stephen E. Potts; Luc R. Van den Elzen; G. Dingemans; E. Langereis; W. Keuning; M. C. M. van de Sanden; W. M. M. Kessels

doi:10.1149/ma2009-02/23/2034

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Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films

Stephen E. Potts Luc R. Van den Elzen G. Dingemans E. Langereis W. Keuning M. C. M. van de Sanden W. M. M. Kessels

Year: 2009 Journal: ECS Meeting Abstracts Vol: MA2009-02 (23)Pages: 2034-2034 Publisher: Institute of Physics

DOI: 10.1149/ma2009-02/23/2034

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Abstract

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Keywords:

Atomic layer deposition Plasma Materials science Layer (electronics) Oxide Thin film Metal Deposition (geology) Chemical engineering Nanotechnology Metallurgy Physics Geology Engineering

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Semiconductor materials and devices

Physical Sciences → Engineering → Electrical and Electronic Engineering

Catalytic Processes in Materials Science

Physical Sciences → Materials Science → Materials Chemistry

Electronic and Structural Properties of Oxides

Physical Sciences → Materials Science → Materials Chemistry

Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films

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