Low temperature growth of Beryllium Oxide thin films prepared via plasma enhanced atomic layer deposition

Yoonseo Jang; Dohwan Jung; Prakash R. Sultane; Eric S. Larsen; Christopher W. Bielawski; Jungwoo Oh

doi:10.1016/j.apsusc.2021.151405

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Low temperature growth of Beryllium Oxide thin films prepared via plasma enhanced atomic layer deposition

Yoonseo Jang Dohwan Jung Prakash R. Sultane Eric S. Larsen Christopher W. Bielawski Jungwoo Oh

Year: 2021 Journal: Applied Surface Science Vol: 572 Pages: 151405-151405 Publisher: Elsevier BV

DOI: 10.1016/j.apsusc.2021.151405

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Keywords:

Beryllium oxide Atomic layer deposition Materials science Thin film Dielectric Band gap Wurtzite crystal structure Substrate (aquarium) Optoelectronics Physical vapor deposition Analytical Chemistry (journal) Nanotechnology Beryllium Metallurgy Chemistry Zinc

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Semiconductor materials and devices

Physical Sciences → Engineering → Electrical and Electronic Engineering

Ferroelectric and Negative Capacitance Devices

Physical Sciences → Engineering → Electrical and Electronic Engineering

Electronic and Structural Properties of Oxides

Physical Sciences → Materials Science → Materials Chemistry

Low temperature growth of Beryllium Oxide thin films prepared via plasma enhanced atomic layer deposition

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