High-yield, wafer-scale fabrication of ultralow-loss, dispersion-engineered silicon nitride photonic circuits
Junqiu LiuGuanhao HuangRui Ning WangJijun HeArslan S. RajaTianyi LiuNils J. EngelsenTobias J. Kippenberg
Abstract
For widespread applications of nonlinear photonic integrated circuits, ultralow optical losses and high fabrication throughput are required. Here, we present a CMOS fabrication technique for photonic microresonators with mean quality factors exceeding 30 millions and wafer-level yield.
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