JOURNAL ARTICLE

Controlled anisotropic etching of polysilicon

Year: 1983 Journal:   Microelectronics Reliability Vol: 23 (3)Pages: 601-601   Publisher: Elsevier BV
Keywords:
Thermionic emission Quantum tunnelling Condensed matter physics Saturation current Doping Transmission coefficient Atmospheric temperature range Rectangular potential barrier Current density Materials science Fermi level Chemistry Physics Electron Electrical engineering Transmission (telecommunications) Voltage Thermodynamics

Metrics

1
Cited By
0.23
FWCI (Field Weighted Citation Impact)
0
Refs
0.54
Citation Normalized Percentile
Is in top 1%
Is in top 10%

Topics

Semiconductor materials and interfaces
Physical Sciences →  Physics and Astronomy →  Atomic and Molecular Physics, and Optics
Semiconductor materials and devices
Physical Sciences →  Engineering →  Electrical and Electronic Engineering
Silicon Nanostructures and Photoluminescence
Physical Sciences →  Materials Science →  Materials Chemistry

Related Documents

JOURNAL ARTICLE

Controlled anisotropic etching of polysilicon

Journal:   Microelectronics Journal Year: 1985 Vol: 16 (4)Pages: 43-43
JOURNAL ARTICLE

Anisotropic plasma etching of polysilicon

C. J. MogabH. J. Levinstein

Journal:   Journal of Vacuum Science and Technology Year: 1980 Vol: 17 (3)Pages: 721-730
JOURNAL ARTICLE

Anisotropic plasma etching of polysilicon using SF6 and CFCl3

M. MiethAnthony Barker

Journal:   Journal of Vacuum Science & Technology A Vacuum Surfaces and Films Year: 1983 Vol: 1 (2)Pages: 629-635
JOURNAL ARTICLE

Highly Anisotropic Etching of Polysilicon by Time-Modulation Bias

Tetsuo OnoTatsumi MizutaniYasushi GotoT. Kure

Journal:   Japanese Journal of Applied Physics Year: 2000 Vol: 39 (8R)Pages: 5003-5003
JOURNAL ARTICLE

Anisotropic highly selective electron cyclotron resonance plasma etching of polysilicon

Prashant GadgilD. DaneT. D. Mantéi

Journal:   Journal of Vacuum Science & Technology A Vacuum Surfaces and Films Year: 1992 Vol: 10 (4)Pages: 1303-1306
© 2026 ScienceGate Book Chapters — All rights reserved.