Resist-free patterned deposition of titanium dioxide thin films by light-induced chemical vapour deposition

Estelle Wagner

doi:10.1016/s0167-9317(04)00113-3

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Resist-free patterned deposition of titanium dioxide thin films by light-induced chemical vapour deposition

Estelle Wagner

Year: 2004 Journal: Microelectronic Engineering Vol: 73-74 Pages: 289-294 Publisher: Elsevier BV

DOI: 10.1016/s0167-9317(04)00113-3

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Keywords:

Titanium dioxide Materials science Rutile Thin film Amorphous solid Titanium Deposition (geology) Substrate (aquarium) Selectivity Anatase Chemical vapor deposition Crystallinity Excimer laser Chemical engineering Nanotechnology Chemistry Optics Photocatalysis Laser Composite material Catalysis Metallurgy Organic chemistry

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Semiconductor materials and devices

Physical Sciences → Engineering → Electrical and Electronic Engineering

ZnO doping and properties

Physical Sciences → Materials Science → Materials Chemistry

Metal and Thin Film Mechanics

Physical Sciences → Engineering → Mechanics of Materials

Resist-free patterned deposition of titanium dioxide thin films by light-induced chemical vapour deposition

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