Resist-free patterned deposition of titanium dioxide thin films by light-induced chemical vapour deposition

Estelle Wagner

doi:10.1016/j.mee.2004.02.055

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Resist-free patterned deposition of titanium dioxide thin films by light-induced chemical vapour deposition

Estelle Wagner

Year: 2004 Journal: Microelectronic Engineering Vol: 73-74 Pages: 289-294 Publisher: Elsevier BV

DOI: 10.1016/j.mee.2004.02.055

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Keywords:

Titanium dioxide Materials science Rutile Amorphous solid Thin film Titanium Substrate (aquarium) Deposition (geology) Crystallinity Selectivity Anatase Chemical vapor deposition Excimer laser Chemical engineering Nanotechnology Chemistry Optics Laser Photocatalysis Composite material Metallurgy Catalysis Organic chemistry

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Semiconductor materials and devices

Physical Sciences → Engineering → Electrical and Electronic Engineering

Electronic and Structural Properties of Oxides

Physical Sciences → Materials Science → Materials Chemistry

Transition Metal Oxide Nanomaterials

Physical Sciences → Materials Science → Polymers and Plastics

Resist-free patterned deposition of titanium dioxide thin films by light-induced chemical vapour deposition

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