HfO<sub>2</sub>-High-k Dielectric for Nanoelectronics

T. P. Smirnova; F. A. Kuznetsov; L. V. Yakovkina; В. В. Каичев; V. I. Kosyakov; М. С. Лебедев; В. Н. Кичай

doi:10.1149/ma2009-02/34/2598

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HfO₂-High-k Dielectric for Nanoelectronics

T. P. Smirnova F. A. Kuznetsov L. V. Yakovkina В. В. Каичев V. I. Kosyakov М. С. Лебедев В. Н. Кичай

Year: 2009 Journal: ECS Meeting Abstracts Vol: MA2009-02 (34)Pages: 2598-2598 Publisher: Institute of Physics

DOI: 10.1149/ma2009-02/34/2598

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Keywords:

Nanoelectronics Dielectric Materials science Engineering physics Nanotechnology Optoelectronics Computer science Physics

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Semiconductor materials and devices

Physical Sciences → Engineering → Electrical and Electronic Engineering

Ferroelectric and Negative Capacitance Devices

Physical Sciences → Engineering → Electrical and Electronic Engineering

Integrated Circuits and Semiconductor Failure Analysis

Physical Sciences → Engineering → Electrical and Electronic Engineering

HfO₂-High-k Dielectric for Nanoelectronics

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HfO2-High-k Dielectric for Nanoelectronics

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