JOURNAL ARTICLE

BEEM studies on metal highK-dielectric HfO2interfaces

Yi ZhengCedric TroadecAndrew T. S. WeeK. L. PeyS. J. O’SheaN. Chandrasekhar

Year: 2007 Journal:   Journal of Physics Conference Series Vol: 61 Pages: 1347-1351   Publisher: IOP Publishing

Abstract

10.1088/1742-6596/61/1/266

Keywords:
High-κ dielectric Materials science Oxide Dielectric Electron Metal Work (physics) Optoelectronics Analytical Chemistry (journal) Chemistry Physics Metallurgy Thermodynamics

Metrics

9
Cited By
1.24
FWCI (Field Weighted Citation Impact)
5
Refs
0.81
Citation Normalized Percentile
Is in top 1%
Is in top 10%

Citation History

Topics

Semiconductor materials and devices
Physical Sciences →  Engineering →  Electrical and Electronic Engineering
Integrated Circuits and Semiconductor Failure Analysis
Physical Sciences →  Engineering →  Electrical and Electronic Engineering
Advancements in Semiconductor Devices and Circuit Design
Physical Sciences →  Engineering →  Electrical and Electronic Engineering

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