JOURNAL ARTICLE
BEEM studies on metal highK-dielectric HfO2interfaces
Yi ZhengCedric TroadecAndrew T. S. WeeK. L. PeyS. J. O’SheaN. Chandrasekhar
Year: 2007 Journal: Journal of Physics Conference Series Vol: 61 Pages: 1347-1351 Publisher: IOP Publishing
Abstract
10.1088/1742-6596/61/1/266
Keywords:
High-κ dielectric Materials science Oxide Dielectric Electron Metal Work (physics) Optoelectronics Analytical Chemistry (journal) Chemistry Physics Metallurgy Thermodynamics
Metrics
9
Cited By
1.24
FWCI (Field Weighted Citation Impact)
5
Refs
0.81
Citation Normalized Percentile
Is in top 1%
Is in top 10%
Citation History
Topics
Semiconductor materials and devices
Physical Sciences → Engineering → Electrical and Electronic Engineering
Integrated Circuits and Semiconductor Failure Analysis
Physical Sciences → Engineering → Electrical and Electronic Engineering
Advancements in Semiconductor Devices and Circuit Design
Physical Sciences → Engineering → Electrical and Electronic Engineering
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