Quaternary hard nanocomposite TiCxNy/SiCN coatings prepared by plasma enhanced chemical vapor deposition

P. Jedrzejowski

doi:10.1016/s0040-6090(04)00397-9

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Quaternary hard nanocomposite TiCxNy/SiCN coatings prepared by plasma enhanced chemical vapor deposition

P. Jedrzejowski

Year: 2004 Journal: Thin Solid Films Publisher: Elsevier BV

DOI: 10.1016/s0040-6090(04)00397-9

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Keywords:

Materials science Plasma-enhanced chemical vapor deposition Nanocomposite Elastic recoil detection X-ray photoelectron spectroscopy Chemical vapor deposition Tin Microstructure Composite material Thin film Nanotechnology Chemical engineering Metallurgy

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Metal and Thin Film Mechanics

Physical Sciences → Engineering → Mechanics of Materials

Diamond and Carbon-based Materials Research

Physical Sciences → Materials Science → Materials Chemistry

Advanced Surface Polishing Techniques

Physical Sciences → Engineering → Biomedical Engineering

Quaternary hard nanocomposite TiCxNy/SiCN coatings prepared by plasma enhanced chemical vapor deposition

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