Wafer scale patterning by soft UV-Nanoimprint Lithography

Ulrich Plachetka

doi:10.1016/s0167-9317(04)00093-0

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Wafer scale patterning by soft UV-Nanoimprint Lithography

Ulrich Plachetka

Year: 2004 Journal: Microelectronic Engineering Vol: 73-74 Pages: 167-171 Publisher: Elsevier BV

DOI: 10.1016/s0167-9317(04)00093-0

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Keywords:

Nanoimprint lithography Wafer Resist Materials science Fabrication Lithography Nanolithography Soft lithography Photolithography Nanotechnology Silicon Next-generation lithography Optoelectronics Electron-beam lithography Layer (electronics)

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Topics

Nanofabrication and Lithography Techniques

Physical Sciences → Engineering → Biomedical Engineering

Metal and Thin Film Mechanics

Physical Sciences → Engineering → Mechanics of Materials

Advancements in Photolithography Techniques

Physical Sciences → Engineering → Electrical and Electronic Engineering

Wafer scale patterning by soft UV-Nanoimprint Lithography

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