Wafer scale patterning by soft UV-Nanoimprint Lithography

Ulrich Plachetka

doi:10.1016/j.mee.2004.02.035

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Wafer scale patterning by soft UV-Nanoimprint Lithography

Ulrich Plachetka

Year: 2004 Journal: Microelectronic Engineering Vol: 73-74 Pages: 167-171 Publisher: Elsevier BV

DOI: 10.1016/j.mee.2004.02.035

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Keywords:

Nanoimprint lithography Wafer Resist Materials science Lithography Fabrication Nanolithography Nanotechnology Photolithography Soft lithography Silicon Next-generation lithography Optoelectronics Electron-beam lithography Layer (electronics)

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Nanofabrication and Lithography Techniques

Physical Sciences → Engineering → Biomedical Engineering

Advancements in Photolithography Techniques

Physical Sciences → Engineering → Electrical and Electronic Engineering

Force Microscopy Techniques and Applications

Physical Sciences → Physics and Astronomy → Atomic and Molecular Physics, and Optics

Wafer scale patterning by soft UV-Nanoimprint Lithography

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