JOURNAL ARTICLE

Structural and Electrical Characterization of TiO2 and Al-Doped TiO2 Films on Ir Electrode for Next Generation DRAM Capacitor

Sora HanSeong Keun KimCheol Seong Hwang

Year: 2010 Journal:   ECS Meeting Abstracts Vol: MA2010-02 (20)Pages: 1445-1445   Publisher: Institute of Physics

Abstract

Abstract not Available.

Keywords:
Characterization (materials science) Capacitor Materials science Doping Dram Electrode Optoelectronics Nanotechnology Electrical engineering Voltage Chemistry Engineering Physical chemistry

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Topics

Semiconductor materials and devices
Physical Sciences →  Engineering →  Electrical and Electronic Engineering
Advanced Memory and Neural Computing
Physical Sciences →  Engineering →  Electrical and Electronic Engineering
Ferroelectric and Negative Capacitance Devices
Physical Sciences →  Engineering →  Electrical and Electronic Engineering
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