Inductively Coupled Ar/CCl2F4 /Cl2 Plasma Etching of Ge

Taek Sung Kim; Sang-Sik Choi; Tae Soo Jeong; Sukill Kang; Kyu-Hwan Shim

doi:10.1149/ma2008-02/37/2380

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Inductively Coupled Ar/CCl2F4 /Cl2 Plasma Etching of Ge

Taek Sung Kim Sang-Sik Choi Tae Soo Jeong Sukill Kang Kyu-Hwan Shim

Year: 2008 Journal: ECS Meeting Abstracts Vol: MA2008-02 (37)Pages: 2380-2380 Publisher: Institute of Physics

DOI: 10.1149/ma2008-02/37/2380

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Abstract

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Keywords:

Inductively coupled plasma Plasma Etching (microfabrication) Materials science Inductively coupled plasma atomic emission spectroscopy Inductively coupled plasma mass spectrometry Analytical Chemistry (journal) Chemistry Nanotechnology Environmental chemistry Chromatography Mass spectrometry Physics Nuclear physics

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Semiconductor materials and devices

Physical Sciences → Engineering → Electrical and Electronic Engineering

Silicon Nanostructures and Photoluminescence

Physical Sciences → Materials Science → Materials Chemistry

Plasma Diagnostics and Applications

Physical Sciences → Engineering → Electrical and Electronic Engineering

Inductively Coupled Ar/CCl2F4 /Cl2 Plasma Etching of Ge

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