JOURNAL ARTICLE

Inductively Coupled Ar/CCl2F4 /Cl2 Plasma Etching of Ge

Taek Sung KimSang-Sik ChoiTae Soo JeongSukill KangKyu-Hwan Shim

Year: 2008 Journal:   ECS Meeting Abstracts Vol: MA2008-02 (37)Pages: 2380-2380   Publisher: Institute of Physics

Abstract

Abstract not Available.

Keywords:
Inductively coupled plasma Plasma Etching (microfabrication) Materials science Inductively coupled plasma atomic emission spectroscopy Inductively coupled plasma mass spectrometry Analytical Chemistry (journal) Chemistry Nanotechnology Environmental chemistry Chromatography Mass spectrometry Physics Nuclear physics

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Plasma Diagnostics and Applications
Physical Sciences →  Engineering →  Electrical and Electronic Engineering

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