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JOURNAL ARTICLE

Impact of Thin La2O3 Insertion for HfO2 MOSFET

Kuniyuki Kakushima Kouichi Okamoto Manabu Adachi K. Tachi Soushi Sato Takamasa Kawanago Jaeyeol Song Parhat Ahmet Nobuyuki Sugii Kazuo Tsutsui Takeo Hattori Hiroshi Iwai

Year: 2008 Journal: ECS Meeting Abstracts Vol: MA2008-01 (18)Pages: 698-698 Publisher: Institute of Physics

DOI: 10.1149/ma2008-01/18/698

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Keywords:

Materials science Computer science

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Topics

Semiconductor materials and devices

Physical Sciences → Engineering → Electrical and Electronic Engineering

Advancements in Semiconductor Devices and Circuit Design

Physical Sciences → Engineering → Electrical and Electronic Engineering

Integrated Circuits and Semiconductor Failure Analysis

Physical Sciences → Engineering → Electrical and Electronic Engineering

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