Workfunction (WF) Simulations of Ta/HfO2, Ta2C/HfO2 and Ta2C/La2O3/HfO2 Capped High-k Stacks

JOURNAL ARTICLE

Year: 2007 Journal: ECS Meeting Abstracts Vol: MA2007-02 (20)Pages: 1125-1125 Publisher: Institute of Physics

DOI: 10.1149/ma2007-02/20/1125

Abstract

Abstract not Available.

Keywords:

Materials science High-κ dielectric Engineering physics Chemical engineering Nanotechnology Optoelectronics Physics Dielectric Engineering

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