BOOK-CHAPTER

Modeling and Simulation of SU-8 Thick Photoresist Lithography

Zai‐Fa ZhouQing‐An Huang

Year: 2017 Toxinology Pages: 1-31   Publisher: Springer Nature (Netherlands)
Keywords:
Photoresist Lithography Materials science Optoelectronics Nanotechnology

Metrics

1
Cited By
0.00
FWCI (Field Weighted Citation Impact)
94
Refs
0.38
Citation Normalized Percentile
Is in top 1%
Is in top 10%

Citation History

Topics

Advancements in Photolithography Techniques
Physical Sciences →  Engineering →  Electrical and Electronic Engineering
Nanofabrication and Lithography Techniques
Physical Sciences →  Engineering →  Biomedical Engineering
Advanced Surface Polishing Techniques
Physical Sciences →  Engineering →  Biomedical Engineering

Related Documents

BOOK-CHAPTER

Modeling and Simulation of SU-8 Thick Photoresist Lithography

Zai‐Fa ZhouQing‐An Huang

Micro/Nano technologies Year: 2018 Pages: 67-97
JOURNAL ARTICLE

A 2D Waveguide Method for Lithography Simulation of Thick SU-8 Photoresist

Zi-Chen GengZai‐Fa ZhouHui DaiQing‐An Huang

Journal:   Micromachines Year: 2020 Vol: 11 (11)Pages: 972-972
JOURNAL ARTICLE

Advanced simulation techniques for thick photoresist lithography

Warren W. FlackGary NewmanDouglas A. BernardJuan C. ReyYuri GranikVictor V. Boksha

Journal:   Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE Year: 1997 Vol: 3049 Pages: 789-789
JOURNAL ARTICLE

Modeling, simulation and experimental verification of inclined UV lithography for SU-8 negative thick photoresists

Zhen ZhuZai‐Fa ZhouQing‐An HuangWeihua Li

Journal:   Journal of Micromechanics and Microengineering Year: 2008 Vol: 18 (12)Pages: 125017-125017
© 2026 ScienceGate Book Chapters — All rights reserved.