Monolithic Epitaxial Integration of β-Ga₂O₃ with 100 Si for Deep Ultraviolet Photodetectors

Abstract

In this report, we demonstrate direct epitaxial integration of β-Ga2O3on a (400) oriented silicon on insulator substrate toward deep-UV (DUV) optoelectronics. The 550 nm thick (400) epitaxial-β-Ga2O3films are deposited onto Si(100) using a two-step buffer and a two-step epilayer scheme. The epitaxial orientation relation between β-Ga2O3, MgO, and silicon(100) is given by (400)β-Ga||(100)MgO||(100)Siand «010»β-Ga||«011»MgO||«110»Si. The presence of rotational variants is confirmed by X-ray diffraction and transmission electron microscopy. Epitaxy was found to be mediated through a MgGa2O4layer formed at the β-Ga2O3/MgO interface under oxygen-deficient conditions during pulsed layer deposition. The ω-scan symmetric and asymmetric full width at half-maximum values of β-Ga2O3are 2.41 and 2.39°, respectively. Photodetectors realized in a conventional metal-semiconductor-metal geometry exhibit a maximum responsivity of 11.8 A/W at 246 nm at 40 V with a photo to dark current ratio of 2.5 × 102and a UV-to-visible rejection ratio > 103. The detectors do not exhibit any persistent photoconductivity as is evident from the rise and fall times of 0.54 and 0.32 s, respectively. Such a monolithic integration of β-Ga2O3on Si(100) opens up opportunities for the development of integrated DUV focal plane arrays on a SoC chip.