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JOURNAL ARTICLE
Copper Interconnects Fabricated by Dry Etching Process
Yasushi Igarashi
Tomomi Yamanobe
Toshio Ito
Year:
1995
DOI:
10.7567/ssdm.1995.s-iv-9
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Keywords:
Materials science
Dry etching
Etching (microfabrication)
Copper
Process (computing)
Optoelectronics
Composite material
Metallurgy
Computer science
Metrics
1
Cited By
0.00
FWCI (Field Weighted Citation Impact)
0
Refs
0.01
Citation Normalized Percentile
Is in top 1%
Is in top 10%
Topics
Copper Interconnects and Reliability
Physical Sciences → Materials Science → Electronic, Optical and Magnetic Materials
3D IC and TSV technologies
Physical Sciences → Engineering → Electrical and Electronic Engineering
Electronic Packaging and Soldering Technologies
Physical Sciences → Engineering → Electrical and Electronic Engineering
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