JOURNAL ARTICLE
Effect of annealing and oxygen partial pressure on the RF sputtered WO3 thin films for electrochromic applications
K. Naveen KumarHabibuddin ShaikAmulya PawarL. N. ChandrashekarSheik Abdul SattarG NithyaR. Imran JafriV. MadhaviJyothi GuptaG.V. Ashok Reddy
Year: 2021 Journal: Materials Today Proceedings Vol: 59 Pages: 339-344 Publisher: Elsevier BV
Keywords:
Electrochromism Tungsten trioxide Materials science Partial pressure Annealing (glass) Thin film Amorphous solid Electrochromic devices Tin oxide Analytical Chemistry (journal) Oxygen Band gap Sputtering Doping Tungsten Transmittance Optoelectronics Metallurgy Nanotechnology Electrode Chemistry Crystallography
Metrics
26
Cited By
2.35
FWCI (Field Weighted Citation Impact)
28
Refs
0.87
Citation Normalized Percentile
Is in top 1%
Is in top 10%
Citation History
Topics
Transition Metal Oxide Nanomaterials
Physical Sciences → Materials Science → Polymers and Plastics
Gas Sensing Nanomaterials and Sensors
Physical Sciences → Engineering → Electrical and Electronic Engineering
Conducting polymers and applications
Physical Sciences → Materials Science → Polymers and Plastics
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