Characteristics of Nickel Oxide Modified Zr-Doped HfO<sub>2 </sub>High-k Thin Films

Chia-Han Yang; Yue Kuo

doi:10.1149/ma2021-0212626mtgabs

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Characteristics of Nickel Oxide Modified Zr-Doped HfO₂High-k Thin Films

Chia-Han Yang Yue Kuo

Year: 2021 Journal: ECS Meeting Abstracts Vol: MA2021-02 (12)Pages: 626-626 Publisher: Institute of Physics

DOI: 10.1149/ma2021-0212626mtgabs

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Keywords:

Materials science Doping Nickel Nickel oxide Thin film Oxide Metallurgy Optoelectronics Nanotechnology

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Characteristics of Nickel Oxide Modified Zr-Doped HfO₂High-k Thin Films

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