JOURNAL ARTICLE

Characteristics of Nickel Oxide Modified Zr-Doped HfO2 High-k Thin Films

Chia-Han YangYue Kuo

Year: 2021 Journal:   ECS Meeting Abstracts Vol: MA2021-02 (12)Pages: 626-626   Publisher: Institute of Physics
Keywords:
Materials science Doping Nickel Nickel oxide Thin film Oxide Metallurgy Optoelectronics Nanotechnology

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Semiconductor materials and devices
Physical Sciences →  Engineering →  Electrical and Electronic Engineering
Ferroelectric and Negative Capacitance Devices
Physical Sciences →  Engineering →  Electrical and Electronic Engineering
Advancements in Semiconductor Devices and Circuit Design
Physical Sciences →  Engineering →  Electrical and Electronic Engineering

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