JOURNAL ARTICLE
Optical properties of silicon oxynitride films grown by plasma-enhanced chemical vapor deposition
R. AschwandenRonja KöthemannMaximilian AlbertChristian GollaC. Meier
Year: 2021 Journal: Thin Solid Films Vol: 736 Pages: 138887-138887 Publisher: Elsevier BV
Keywords:
Silicon oxynitride Chemical vapor deposition Silane Plasma-enhanced chemical vapor deposition Silicon oxide Substrate (aquarium) Silicon Desorption Thin film Ellipsometry Refractive index Analytical Chemistry (journal) Deposition (geology) Materials science Oxide Adsorption Chemical engineering Chemistry Nanotechnology Silicon nitride Physical chemistry Optoelectronics Organic chemistry Composite material
Metrics
12
Cited By
0.73
FWCI (Field Weighted Citation Impact)
25
Refs
0.72
Citation Normalized Percentile
Is in top 1%
Is in top 10%
Citation History
Topics
Semiconductor materials and devices
Physical Sciences → Engineering → Electrical and Electronic Engineering
Silicon Nanostructures and Photoluminescence
Physical Sciences → Materials Science → Materials Chemistry
Thin-Film Transistor Technologies
Physical Sciences → Engineering → Electrical and Electronic Engineering
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