JOURNAL ARTICLE

Optical and structural properties of silicon oxynitride deposited by plasma enhanced chemical vapor deposition

Julien DupuisErwann FourmondD. BallutaudN. BérerdM. Lemiti

Year: 2010 Journal:   Thin Solid Films Vol: 519 (4)Pages: 1325-1333   Publisher: Elsevier BV
Keywords:
Plasma-enhanced chemical vapor deposition Silicon oxynitride Elastic recoil detection Passivation Silane Silicon nitride Materials science Chemical vapor deposition Ellipsometry Silicon Annealing (glass) Crystalline silicon Silicon oxide Analytical Chemistry (journal) Chemical engineering Thin film Chemistry Nanotechnology Optoelectronics Composite material Layer (electronics)

Metrics

42
Cited By
1.81
FWCI (Field Weighted Citation Impact)
28
Refs
0.87
Citation Normalized Percentile
Is in top 1%
Is in top 10%

Citation History

Topics

Thin-Film Transistor Technologies
Physical Sciences →  Engineering →  Electrical and Electronic Engineering
Silicon Nanostructures and Photoluminescence
Physical Sciences →  Materials Science →  Materials Chemistry
Semiconductor materials and devices
Physical Sciences →  Engineering →  Electrical and Electronic Engineering
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