Effect of Cu addition on the properties of the RF magnetron-sputtered Cu2O thin films

Boen Houng; Jhih Kai Wu; Peng Chieh Yeh; W. Yeh; Chen Sun

doi:10.1007/s10832-021-00234-x

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Effect of Cu addition on the properties of the RF magnetron-sputtered Cu2O thin films

Boen Houng Jhih Kai Wu Peng Chieh Yeh W. Yeh Chen Sun

Year: 2020 Journal: Journal of Electroceramics Vol: 45 (3)Pages: 129-134 Publisher: Springer Science+Business Media

DOI: 10.1007/s10832-021-00234-x

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Keywords:

Materials science Microstructure Thin film Transmission electron microscopy Sputter deposition Doping Raman spectroscopy Analytical Chemistry (journal) Scanning electron microscope Sputtering Electrical resistivity and conductivity Grain size Composite material Nanotechnology Optoelectronics Optics

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Copper-based nanomaterials and applications

Physical Sciences → Materials Science → Materials Chemistry

ZnO doping and properties

Physical Sciences → Materials Science → Materials Chemistry

Electronic and Structural Properties of Oxides

Physical Sciences → Materials Science → Materials Chemistry

Effect of Cu addition on the properties of the RF magnetron-sputtered Cu2O thin films

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