JOURNAL ARTICLE

Surface passivation of germanium by atomic layer deposited Al2O3 nanolayers

Wilhelmus J. H. BerghuisJimmy MelskensBart MaccoRoel J. TheeuwesMarcel A. VerheijenW. M. M. Kessels

Year: 2021 Journal:   Journal of materials research/Pratt's guide to venture capital sources Vol: 36 (3)Pages: 571-581   Publisher: Springer Nature
Keywords:
Passivation Materials science Atomic layer deposition Germanium Substrate (aquarium) Layer (electronics) Deposition (geology) Semiconductor Analytical Chemistry (journal) Silicon Nanotechnology Optoelectronics Chemistry

Metrics

37
Cited By
2.66
FWCI (Field Weighted Citation Impact)
81
Refs
0.91
Citation Normalized Percentile
Is in top 1%
Is in top 10%

Citation History

Topics

Semiconductor materials and devices
Physical Sciences →  Engineering →  Electrical and Electronic Engineering
Silicon Nanostructures and Photoluminescence
Physical Sciences →  Materials Science →  Materials Chemistry
Semiconductor materials and interfaces
Physical Sciences →  Physics and Astronomy →  Atomic and Molecular Physics, and Optics
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