Femtosecond Laser-Induced Nanotopography in Silicon

S. A. Romashevskiy

doi:10.1364/assl.2020.jth2a.5

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JOURNAL ARTICLE

Femtosecond Laser-Induced Nanotopography in Silicon

S. A. Romashevskiy

Year: 2020 Journal: Laser Congress 2020 (ASSL, LAC) Vol: 42 Pages: JTh2A.5-JTh2A.5

DOI: 10.1364/assl.2020.jth2a.5

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Abstract

Nanotopography features of silicon induced by single femtosecond laser pulses at minimally disruptive intensities in different environments are reported. The specific nanoscale patterns present the first structural response to the ultrafast heating.

Keywords:

Femtosecond Nanotopography Silicon Materials science Nanoscopic scale Laser Ultrashort pulse Optoelectronics Ultrafast optics Laser beams Optics Nanotechnology Physics

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Laser Material Processing Techniques

Physical Sciences → Engineering → Computational Mechanics

Laser-induced spectroscopy and plasma

Physical Sciences → Engineering → Mechanics of Materials

Advanced Surface Polishing Techniques

Physical Sciences → Engineering → Biomedical Engineering

Femtosecond Laser-Induced Nanotopography in Silicon

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