Co-sputtered tantalum-doped tin oxide thin films for transparent conducting applications

M.F. Al-Kuhaili

doi:10.1016/j.matchemphys.2020.123749

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Co-sputtered tantalum-doped tin oxide thin films for transparent conducting applications

M.F. Al-Kuhaili

Year: 2020 Journal: Materials Chemistry and Physics Vol: 257 Pages: 123749-123749 Publisher: Elsevier BV

DOI: 10.1016/j.matchemphys.2020.123749

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Keywords:

Materials science Transparent conducting film Sputtering Tantalum Optoelectronics Tin oxide Thin film Doping Band gap Tin Electrical resistivity and conductivity Dopant Electrical conductor Semiconductor Nanotechnology Composite material Metallurgy Electrical engineering

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ZnO doping and properties

Physical Sciences → Materials Science → Materials Chemistry

Gas Sensing Nanomaterials and Sensors

Physical Sciences → Engineering → Electrical and Electronic Engineering

Thin-Film Transistor Technologies

Physical Sciences → Engineering → Electrical and Electronic Engineering

Co-sputtered tantalum-doped tin oxide thin films for transparent conducting applications

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