Scalable and consistent fabrication of plasmonic colors via nanoimprint lithography

Abstract

We utilised thermal and UV-assisted Nanoimprint Lithography (NIL) i.e. thermal and UV-assisted to produce plasmonic coloration, and compare their ability for scalable fabrication. Several designs are presented and we show the generated colors are dependent on their geometry and the direction of polarisation of incident illumination. Finally, we demonstrated UV-NIL for consistent production of large-area (0.6×0.4 cm2) plasmonic color with extended color gamut.