JOURNAL ARTICLE

Instant Cu-to-Cu direct bonding enabled by 〈111〉-oriented nanotwinned Cu bumps

Kai Cheng ShieJing-Ye JuangChih Chen

Year: 2019 Journal:   Japanese Journal of Applied Physics Vol: 59 (SB)Pages: SBBA03-SBBA03   Publisher: Institute of Physics

Abstract

Abstract Cu-to-Cu direct bonding was successfully achieved in 10 s with 〈111〉-oriented nanotwinned Cu (nt-Cu) bumps in ambient N 2 . The bonding temperature and pressure were 300 °C and 90 MPa, respectively. A nearly void-free interface and a low bump resistance of 4.9 mΩ can be observed after a short-time bonding process. Besides, longer bonding times of 60 s and 30 s were employed, but the resistances of the Cu joints did not decrease significantly when the bonding time increased to 60 s. However, the nt-Cu columnar grains started to recrystallize during the 60 s bonding and started detwinning in 10 s bonding. Yet, the bonding interface remained under such a short bonding time.

Keywords:
Direct bonding Anodic bonding Materials science Bonding strength Thermocompression bonding Composite material Void (composites) Metallurgy Crystallography Chemistry Layer (electronics) Silicon

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Citation History

Topics

3D IC and TSV technologies
Physical Sciences →  Engineering →  Electrical and Electronic Engineering
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Physical Sciences →  Engineering →  Electrical and Electronic Engineering
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Physical Sciences →  Materials Science →  Electronic, Optical and Magnetic Materials
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