On the cause of a double hysteresis during reactive magnetron sputtering

Koen Strijckmans; R. Schelfhout; Diederik Depla

doi:10.13140/rg.2.2.26989.28642

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On the cause of a double hysteresis during reactive magnetron sputtering

Koen Strijckmans R. Schelfhout Diederik Depla

Year: 2017 Journal: Ghent University Academic Bibliography (Ghent University) Publisher: Ghent University

DOI: 10.13140/rg.2.2.26989.28642

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Keywords:

Hysteresis Materials science Sputtering Sputter deposition High-power impulse magnetron sputtering Cavity magnetron Metallurgy Physics Condensed matter physics Nanotechnology Thin film

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Advanced Materials Characterization Techniques

Physical Sciences → Engineering → Biomedical Engineering

Metal and Thin Film Mechanics

Physical Sciences → Engineering → Mechanics of Materials

nanoparticles nucleation surface interactions

Physical Sciences → Earth and Planetary Sciences → Atmospheric Science

On the cause of a double hysteresis during reactive magnetron sputtering

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