ChemInform Abstract: Vapor Phase Deposition of Palladium for Electroless Copper Plating.

R. R. Thomas; J. M. Park

doi:10.1002/chin.198941343

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ChemInform Abstract: Vapor Phase Deposition of Palladium for Electroless Copper Plating.

R. R. Thomas J. M. Park

Year: 1989 Journal: ChemInform Vol: 20 (41) Publisher: Wiley

DOI: 10.1002/chin.198941343

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Abstract

Abstract Allylcyclopentadienylpalladium, (III), exhibits unusual volatility at room temp. and its photochemical decomposition in the gas phase results in the deposition of a film consisting of a homogeneous mixture of Pd particles in an organic polymer matrix.

Keywords:

Chemistry Palladium Volatility (finance) Copper Homogeneous Deposition (geology) Decomposition Polymer Phase (matter) Chemical engineering Chemical vapor deposition Copper plating Inorganic chemistry Polymer chemistry Organic chemistry Electroplating Catalysis

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Copper Interconnects and Reliability

Physical Sciences → Materials Science → Electronic, Optical and Magnetic Materials

Block Copolymer Self-Assembly

Physical Sciences → Materials Science → Materials Chemistry

Molecular Junctions and Nanostructures

Physical Sciences → Engineering → Electrical and Electronic Engineering

ChemInform Abstract: Vapor Phase Deposition of Palladium for Electroless Copper Plating.

Abstract

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