HIGH-ASPECT RATIO MICROSTRUCTURES IN BOROSILICATE GLASS BY MOLDING AND SACRIFICIAL SILICON ETCHING: CAPABILITIES AND LIMITS

Abstract

We have demonstrated a microfabrication technique to create very high aspect-ratio and vertical structures in borosilicate glass.By molding glass in deep silicon trenches, we achieved glass structure aspect-ratios of 42, heights of 212 µm and vertical wall angles up to 89.7°.We also parametrized the impact of molding parameters (heat treatment time and temperature) and defined the process limitations for defect free structures.