Fabrication of high aspect ratio silicon microstructures by anodic etching

Martin D. B. Charlton; G.J. Parker

doi:10.1088/0960-1317/7/3/020

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Fabrication of high aspect ratio silicon microstructures by anodic etching

Martin D. B. Charlton G.J. Parker

Year: 1997 Journal: Journal of Micromechanics and Microengineering Vol: 7 (3)Pages: 155-158 Publisher: IOP Publishing

DOI: 10.1088/0960-1317/7/3/020

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Abstract

We describe a refinement of the anodization process commonly used for the formation of porous silicon, which allows the fabrication of arrays of very high aspect ratio sub-micron pores and free-standing pillars. These structures are shown to possess a wide photonic band gap in the near infra red.

Keywords:

Fabrication Silicon Materials science Anodizing Etching (microfabrication) Porous silicon Aspect ratio (aeronautics) Microstructure Optoelectronics Nanotechnology Anode Metallurgy Electrode Aluminium Chemistry Layer (electronics)

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Silicon Nanostructures and Photoluminescence

Physical Sciences → Materials Science → Materials Chemistry

Photonic Crystals and Applications

Physical Sciences → Physics and Astronomy → Atomic and Molecular Physics, and Optics

Anodic Oxide Films and Nanostructures

Physical Sciences → Materials Science → Materials Chemistry

Fabrication of high aspect ratio silicon microstructures by anodic etching

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