High aspect ratio anisotropic silicon etching for x-ray phase contrast imaging grating fabrication

Patrick Sean Finnegan; Andrew E Hollowell; Christian Lew Arrington; Amber L. Dagel

doi:10.1016/j.mssp.2018.06.013

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High aspect ratio anisotropic silicon etching for x-ray phase contrast imaging grating fabrication

Patrick Sean Finnegan Andrew E Hollowell Christian Lew Arrington Amber L. Dagel

Year: 2018 Journal: Materials Science in Semiconductor Processing Vol: 92 Pages: 80-85 Publisher: Elsevier BV

DOI: 10.1016/j.mssp.2018.06.013

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Keywords:

Materials science Wafer Etching (microfabrication) Silicon Fabrication Potassium hydroxide Aspect ratio (aeronautics) Optics Grating Anisotropy Optoelectronics Isotropic etching Contrast ratio Phase (matter) Nanotechnology

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Advanced X-ray Imaging Techniques

Physical Sciences → Physics and Astronomy → Radiation

Optical measurement and interference techniques

Physical Sciences → Computer Science → Computer Vision and Pattern Recognition

Advanced Surface Polishing Techniques

Physical Sciences → Engineering → Biomedical Engineering

High aspect ratio anisotropic silicon etching for x-ray phase contrast imaging grating fabrication

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