JOURNAL ARTICLE

High aspect ratio anisotropic silicon etching for x-ray phase contrast imaging grating fabrication

Patrick Sean FinneganAndrew E HollowellChristian Lew ArringtonAmber L. Dagel

Year: 2018 Journal:   Materials Science in Semiconductor Processing Vol: 92 Pages: 80-85   Publisher: Elsevier BV
Keywords:
Materials science Wafer Etching (microfabrication) Silicon Fabrication Potassium hydroxide Aspect ratio (aeronautics) Optics Grating Anisotropy Optoelectronics Isotropic etching Contrast ratio Phase (matter) Nanotechnology

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29
Cited By
4.08
FWCI (Field Weighted Citation Impact)
19
Refs
0.94
Citation Normalized Percentile
Is in top 1%
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Citation History

Topics

Advanced X-ray Imaging Techniques
Physical Sciences →  Physics and Astronomy →  Radiation
Optical measurement and interference techniques
Physical Sciences →  Computer Science →  Computer Vision and Pattern Recognition
Advanced Surface Polishing Techniques
Physical Sciences →  Engineering →  Biomedical Engineering
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