High aspect ratio gratings for X-ray phase contrast imaging

Abstract

Differential phase contrast X-ray imaging (DPCI) has gained a lot of interest in the past years. It is based on X-ray grating interferometry and the image quality is strongly dependant on the grating quality. Periodic line and space structures with periods in the micron range are required for the source and absorption grating. In case of energies > 30 keV their height should be larger than 100 μm resulting in aspect ratios of more than 100. Deep X-ray lithography and gold electroforming (LIGA technology) is used to fabricate these challenging structures. After resist, design and process optimization gratings with 2.4 μm period have been electroformed up to 120 μm, Visibilities of up to 70% for 29 keV and up to 20% for 52 keV have been achieved for monochromatic synchrotron light. Structures with larger periods could be manufactured up to 200 μm; further increase of the height and the gratings quality is possible yielding to high performance gratings also for high energies.