Functional Microstructures via Direct Laser Writing

Abstract

In the current thesis novel chemical photoresist systems for the fabrication of functional microstructures via three dimensional lithography are described. Next to in-depth characterization of the produced structures, the selected polymerization procedures during curing allowed for covalent postmodification. For the different curing systems, namely for thiol-ene, thiol-yne, and photoenol chemistry, structures were modified in a single, dual, and spatially resolved manner by click chemistry.