(Invited) Past, Present, and Future of High-k/Metal Gate Technologies

Hiroshi Iwai

doi:10.1149/08001.0003ecst

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JOURNAL ARTICLE

(Invited) Past, Present, and Future of High-k/Metal Gate Technologies

Hiroshi Iwai

Year: 2017 Journal: ECS Transactions Vol: 80 (1)Pages: 3-16 Publisher: Institute of Physics

DOI: 10.1149/08001.0003ecst

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Abstract

In this paper, past, present, and future of high-k/metal gate stack technologies are described, at the occasion of the workshop for the memory of late Prof. Samares Kar who initiated an ECS symposium on "Physics and Technology of High-k Gate Dielectrics" in 2002, at the 202nd ECS meeting held in Salt Lake City, Utah.

Keywords:

Salt lake High-κ dielectric Metal gate Engineering physics Stack (abstract data type) Engineering Electrical engineering Dielectric Computer science Geology Transistor Gate oxide Operating system

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Semiconductor materials and devices

Physical Sciences → Engineering → Electrical and Electronic Engineering

Advancements in Semiconductor Devices and Circuit Design

Physical Sciences → Engineering → Electrical and Electronic Engineering

Integrated Circuits and Semiconductor Failure Analysis

Physical Sciences → Engineering → Electrical and Electronic Engineering

(Invited) Past, Present, and Future of High-k/Metal Gate Technologies

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