Deposition of photocatalytic anatase titanium dioxide films by atmospheric dielectric barrier discharge

Qianqian Chen; Qirong Liu; Julie Hubert; Weide Huang; Kitty Baert; Gilles Wallaert; Herman Terryn; Marie-Paule Delplancke-Ogletree; François Reniers

doi:10.1016/j.surfcoat.2016.12.077

JOURNAL ARTICLE

Deposition of photocatalytic anatase titanium dioxide films by atmospheric dielectric barrier discharge

Qianqian Chen Qirong Liu Julie Hubert Weide Huang Kitty Baert Gilles Wallaert Herman Terryn Marie-Paule Delplancke-Ogletree François Reniers

Year: 2016 Journal: Surface and Coatings Technology Vol: 310 Pages: 173-179 Publisher: Elsevier BV

DOI: 10.1016/j.surfcoat.2016.12.077

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Keywords:

Materials science Anatase X-ray photoelectron spectroscopy Photocatalysis Titanium dioxide Raman spectroscopy Annealing (glass) Thin film Chemical engineering Analytical Chemistry (journal) Scanning electron microscope Chemical vapor deposition Fourier transform infrared spectroscopy Rutile Nanotechnology Composite material Optics Chemistry Organic chemistry

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Plasma Applications and Diagnostics

Health Sciences → Medicine → Radiology, Nuclear Medicine and Imaging

Advanced Photocatalysis Techniques

Physical Sciences → Energy → Renewable Energy, Sustainability and the Environment

Gas Sensing Nanomaterials and Sensors

Physical Sciences → Engineering → Electrical and Electronic Engineering

Deposition of photocatalytic anatase titanium dioxide films by atmospheric dielectric barrier discharge

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