Atmospheric pressure plasma deposition of thin films by Townsend dielectric barrier discharge

F. Massines; Nicolas Ghérardi; Antonella Fornelli; Steve W. Martin

doi:10.1016/j.surfcoat.2005.08.010

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Atmospheric pressure plasma deposition of thin films by Townsend dielectric barrier discharge

F. Massines Nicolas Ghérardi Antonella Fornelli Steve W. Martin

Year: 2005 Journal: Surface and Coatings Technology Vol: 200 (5-6)Pages: 1855-1861 Publisher: Elsevier BV

DOI: 10.1016/j.surfcoat.2005.08.010

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Keywords:

Hexamethyldisiloxane Materials science X-ray photoelectron spectroscopy Thin film Ellipsometry Analytical Chemistry (journal) Fourier transform infrared spectroscopy Dielectric barrier discharge Atmospheric-pressure plasma Plasma-enhanced chemical vapor deposition Trimethylsilane Silicon oxide Atmospheric pressure Dielectric Layer (electronics) Plasma Chemical engineering Composite material Nanotechnology Chemistry Optoelectronics Organic chemistry

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Plasma Applications and Diagnostics

Health Sciences → Medicine → Radiology, Nuclear Medicine and Imaging

Plasma Diagnostics and Applications

Physical Sciences → Engineering → Electrical and Electronic Engineering

Surface Modification and Superhydrophobicity

Physical Sciences → Materials Science → Surfaces, Coatings and Films

Atmospheric pressure plasma deposition of thin films by Townsend dielectric barrier discharge

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