JOURNAL ARTICLE

Atmospheric pressure plasma deposition of thin films by Townsend dielectric barrier discharge

F. MassinesNicolas GhérardiAntonella FornelliSteve W. Martin

Year: 2005 Journal:   Surface and Coatings Technology Vol: 200 (5-6)Pages: 1855-1861   Publisher: Elsevier BV
Keywords:
Hexamethyldisiloxane Materials science X-ray photoelectron spectroscopy Thin film Ellipsometry Analytical Chemistry (journal) Fourier transform infrared spectroscopy Dielectric barrier discharge Atmospheric-pressure plasma Plasma-enhanced chemical vapor deposition Trimethylsilane Silicon oxide Atmospheric pressure Dielectric Layer (electronics) Plasma Chemical engineering Composite material Nanotechnology Chemistry Optoelectronics Organic chemistry

Metrics

210
Cited By
4.27
FWCI (Field Weighted Citation Impact)
22
Refs
0.93
Citation Normalized Percentile
Is in top 1%
Is in top 10%

Citation History

Topics

Plasma Applications and Diagnostics
Health Sciences →  Medicine →  Radiology, Nuclear Medicine and Imaging
Plasma Diagnostics and Applications
Physical Sciences →  Engineering →  Electrical and Electronic Engineering
Surface Modification and Superhydrophobicity
Physical Sciences →  Materials Science →  Surfaces, Coatings and Films
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