Photomask displacement technology for continuous profile generation by mask aligner lithography

Tina Weichelt; Robert Kinder; Uwe D. Zeitner

doi:10.1088/2040-8978/18/12/125401

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Photomask displacement technology for continuous profile generation by mask aligner lithography

Tina Weichelt Robert Kinder Uwe D. Zeitner

Year: 2016 Journal: Journal of Optics Vol: 18 (12)Pages: 125401-125401 Publisher: IOP Publishing

DOI: 10.1088/2040-8978/18/12/125401

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Abstract

5 S.

Keywords:

Photomask Lithography Optics Displacement (psychology) Materials science Maskless lithography Photolithography Extreme ultraviolet lithography Electron-beam lithography Resist Physics Nanotechnology

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Optical Coatings and Gratings

Physical Sciences → Materials Science → Surfaces, Coatings and Films

Advancements in Photolithography Techniques

Physical Sciences → Engineering → Electrical and Electronic Engineering

Advanced optical system design

Physical Sciences → Engineering → Biomedical Engineering

Photomask displacement technology for continuous profile generation by mask aligner lithography

Abstract

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Citation History

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