JOURNAL ARTICLE

Photomask displacement technology for continuous profile generation by mask aligner lithography

Tina WeicheltRobert KinderUwe D. Zeitner

Year: 2016 Journal:   Journal of Optics Vol: 18 (12)Pages: 125401-125401   Publisher: IOP Publishing

Abstract

5 S.

Keywords:
Photomask Lithography Optics Displacement (psychology) Materials science Maskless lithography Photolithography Extreme ultraviolet lithography Electron-beam lithography Resist Physics Nanotechnology

Metrics

3
Cited By
0.00
FWCI (Field Weighted Citation Impact)
25
Refs
0.11
Citation Normalized Percentile
Is in top 1%
Is in top 10%

Citation History

Topics

Optical Coatings and Gratings
Physical Sciences →  Materials Science →  Surfaces, Coatings and Films
Advancements in Photolithography Techniques
Physical Sciences →  Engineering →  Electrical and Electronic Engineering
Advanced optical system design
Physical Sciences →  Engineering →  Biomedical Engineering

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