A simple mask aligner and printing frame for conformable photomask lithography

Abstract

Conformable photomask lithography allows submicrometer lines to be replicated by contact printing. Surface acoustic wave devices with 0.4-µm lines have been produced using this technique. A mask aligner and printing frame have been designed which feature micrometer controlled X and Y motion, rotation about the center of the viewing field, and both top and bottom illumination of mask and substrate. The construction and use of the apparatus, which is based on a toolmaker's microscope, is fully described.