Nanostructure and Microstructure Evolution of D.C. Reactive Magnetron Sputtered CrN Thin Films

Abstract

The CrN thin films were deposited on silicon (100) substrate using reactive magnetron sputtering technique. The films were characterized by XRD, FE-SEM, EDS and nanoindentation techniques to examine the effect of deposition time on crystal structure, compositions, microstructure and hardness. The crystal structure, microstructure, element composition and hardness. The higher crystallinity through longer deposition time were investigated. The grain aggregration with columnar structure were obtained from FE-SEM. The Cr and N contents were not direct relationship with deposition time. The CrN coated sample performed hardness varied between 9 - 16 GPa.