Fabrication of Micro Three Dimensional Structures by Two Photon Polymerization with SiO/Resin

Abstract

In this paper we presented the synthesis of TEOS with photoresist in order to use it like a hybrid material for 3D printer on the micrometer scale by means of the two-photon polymerization process, in which two photon are absorbed simultaneously by the material using an ultrafast laser causing its polymerization. We analyzed the mix of TEOS and photoresist with UV-VIS and FTIR spectrometers, checking that complies with two important conditions: has an optical transmission at 780 nm and absorbs at 390 nm. Finally we fabricated micro-structures with a new hybrid material; TEOS does not absorb the laser in this system and does not interfere with the formation of a three-dimensional structure. After formation the 3D microstructure, samples were heated to form the SiO. These samples of microstructures were observed under digital microscope and SEM.