ChemInform Abstract: SELECTIVE ETCHING OF SILICON DIOXIDE USING REACTIVE ION ETCHING WITH FLUOROMETHANE‐MOLECULAR HYDROGEN

L. M. Ephrath

doi:10.1002/chin.197949012

ScienceGate Book Chapters

JOURNAL ARTICLE

ChemInform Abstract: SELECTIVE ETCHING OF SILICON DIOXIDE USING REACTIVE ION ETCHING WITH FLUOROMETHANE‐MOLECULAR HYDROGEN

L. M. Ephrath

Year: 1979 Journal: Chemischer Informationsdienst Vol: 10 (49) Publisher: Wiley

DOI: 10.1002/chin.197949012

Get Full-Text PDF Get Analytical Report

Keywords:

Silicon dioxide Etching (microfabrication) Reactive-ion etching Silicon Hydrogen Ion Chemistry Nanotechnology Materials science Organic chemistry Composite material

Metrics

Cited By

0.00

FWCI (Field Weighted Citation Impact)

Refs

0.33

Citation Normalized Percentile

Is in top 1%

Is in top 10%

Topics

Chemical Synthesis and Characterization

Physical Sciences → Environmental Science → Industrial and Manufacturing Engineering

Mesoporous Materials and Catalysis

Physical Sciences → Materials Science → Materials Chemistry

Gas Sensing Nanomaterials and Sensors

Physical Sciences → Engineering → Electrical and Electronic Engineering

ChemInform Abstract: SELECTIVE ETCHING OF SILICON DIOXIDE USING REACTIVE ION ETCHING WITH FLUOROMETHANE‐MOLECULAR HYDROGEN

Metrics

Topics

Related Documents

Selective Etching of Silicon Dioxide Using Reactive Ion Etching with CF 4 ‐ H 2

Selective reactive ion etching of silicon dioxide

Selective reactive ion etching of silicon dioxide

ChemInform Abstract: PLASMA ETCHING OF SILICON AND SILICON DIOXIDE WITH HYDROGEN FLUORIDE MIXTURES

ChemInform Abstract: Highly Selective Reactive Ion Etching of Polysilicon with Hydrogen Bromide.