JOURNAL ARTICLE

Inkjet-Printed In2O3 Thin-Film Transistor below 200 °C

Jun Seok LeeYoung‐Jin KwackWoon‐Seop Choi

Year: 2013 Journal:   ACS Applied Materials & Interfaces Vol: 5 (22)Pages: 11578-11583   Publisher: American Chemical Society

Abstract

High-performance In2O3 thin-film transistors could be prepared by an inkjet-printing method below 200 °C with a single precursor and solvent formulation. The self-combustion reaction took place with the electrical properties of In2O3 at a low temperature of 147 °C, which was confirmed by X-ray photoelectron spectroacopy and thermal analysis. The electrical properties after postannealing at 200 °C were as follows: a mobility of 3.98 cm(2)/V·s, a threshold voltage of 1.83 V, a subthreshold slope of 0.4 V/dec, and an on-to-off current ratio of 10(8), which are the best properties by an inkjet process thus far. The positive bias stability was much improved by postannealing, and good negative bias stability was obtained.

Keywords:
Materials science Thin-film transistor Transistor Threshold voltage Thermal stability Thin film Subthreshold slope Optoelectronics Electron mobility Nanotechnology Analytical Chemistry (journal) Voltage Chemical engineering Electrical engineering Organic chemistry

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