Stress Evolution in Ultra Thin Sputtered Films

Quanmin Su; R. C. Cammarata; Manfred Wuttig

doi:10.1557/proc-405-475

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Stress Evolution in Ultra Thin Sputtered Films

Quanmin Su R. C. Cammarata Manfred Wuttig

Year: 1995 Journal: MRS Proceedings Vol: 405 Publisher: Cambridge University Press

DOI: 10.1557/proc-405-475

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Keywords:

Materials science Thin film Scanning tunneling microscope Stress relaxation Stress (linguistics) Relaxation (psychology) Substrate (aquarium) Composite material Microstructure Sputtering Deposition (geology) Sputter deposition Layer (electronics) Nanotechnology Creep

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Ion-surface interactions and analysis

Physical Sciences → Engineering → Computational Mechanics

Semiconductor materials and devices

Physical Sciences → Engineering → Electrical and Electronic Engineering

Metal and Thin Film Mechanics

Physical Sciences → Engineering → Mechanics of Materials

Stress Evolution in Ultra Thin Sputtered Films

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