Structural and photoelectrochemical properties of Ti1−xWxO2 thin films deposited by magnetron sputtering

G. Abadias; Aldo Saul Gago; Nicolás Alonso‐Vante

doi:10.1016/j.surfcoat.2011.02.011

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Structural and photoelectrochemical properties of Ti1−xWxO2 thin films deposited by magnetron sputtering

G. Abadias Aldo Saul Gago Nicolás Alonso‐Vante

Year: 2011 Journal: Surface and Coatings Technology Vol: 205 Pages: S265-S270 Publisher: Elsevier BV

DOI: 10.1016/j.surfcoat.2011.02.011

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Keywords:

Materials science Anatase Nanocrystalline material Thin film Amorphous solid Sputter deposition Annealing (glass) Tungsten Titanium Sputtering Rutile Chemical engineering X-ray reflectivity Titanium dioxide Analytical Chemistry (journal) Photocatalysis Metallurgy Nanotechnology Crystallography Catalysis

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Advanced Photocatalysis Techniques

Physical Sciences → Energy → Renewable Energy, Sustainability and the Environment

Electronic and Structural Properties of Oxides

Physical Sciences → Materials Science → Materials Chemistry

TiO2 Photocatalysis and Solar Cells

Physical Sciences → Energy → Renewable Energy, Sustainability and the Environment

Structural and photoelectrochemical properties of Ti1−xWxO2 thin films deposited by magnetron sputtering

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