Characterization of Post - Annealed PZT Thin Films Deposited Using Pulsed Laser Ablation

Jyrki Lapp Alainen; Johannes Frantti; S. Leppävuori

doi:10.1557/proc-361-581

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Characterization of Post - Annealed PZT Thin Films Deposited Using Pulsed Laser Ablation

Jyrki Lapp Alainen Johannes Frantti S. Leppävuori

Year: 1994 Journal: MRS Proceedings Vol: 361 Publisher: Cambridge University Press

DOI: 10.1557/proc-361-581

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Keywords:

Materials science Fluence Thin film Sapphire Tetragonal crystal system Pulsed laser deposition Analytical Chemistry (journal) Annealing (glass) Excimer laser Laser ablation Lead zirconate titanate Laser Ferroelectricity Optics Optoelectronics Dielectric Crystal structure Composite material Nanotechnology Crystallography

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Ferroelectric and Piezoelectric Materials

Physical Sciences → Materials Science → Materials Chemistry

Electronic and Structural Properties of Oxides

Physical Sciences → Materials Science → Materials Chemistry

Photorefractive and Nonlinear Optics

Physical Sciences → Physics and Astronomy → Atomic and Molecular Physics, and Optics

Characterization of Post - Annealed PZT Thin Films Deposited Using Pulsed Laser Ablation

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